Batch-type RCA Cleaning Equipment
Batch-type RCA Cleaning Equipment
Equipment Name
Batch-type RCA Cleaning Equipment
Equipment Model
SC-CSZJ9600E-20F
Equipment Application
Used for wrap around removal & cleaning of the diffused silicon wafers.
Process Flow
Wrap Around Removal→Post-clean→Acid Clean→Post-clean→Acid Clean→Hot Water Drying→Drying (for reference)
Features
1、Throughput: 400pcs/batch, 9600pcs/h(210mm wafer),480pcs/batch, 12000pcs/h (182mm wafer).
2、Various additive technologies available.
3、Wafer thickness down to 120μm.
4、With dry clean area and self-cleaning system.
5、Quick inline bath change.
6、Available with MES, RFID system, inline weight testing optional.
Parameters
|
